在导电ZrN支撑层上生长的碳纳米管TSV

S. Vollebregt, Souri Banerjee, F. Tichelaar, R. Ishihara
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引用次数: 4

摘要

碳纳米管(CNT)由于其高长宽比、优异的机械性能和热性能以及高载流能力而成为硅通孔(TSV)的一种有吸引力的替代填充材料。理论上,它们在通孔电阻方面优于铜。到目前为止,文献中报道的所有碳纳米管TSV都是使用电隔离催化剂支撑层制备的。在这项工作中,我们展示了在导电ZrN层上生长长宽比高达35的碳纳米管。这被用来制造第一个由碳纳米管束两侧的金属薄膜直接接触的碳纳米管TSV,而不是诉诸于使用探针针。
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Carbon nanotubes TSV grown on an electrically conductive ZrN support layer
Carbon nanotubes (CNT) are an attractive alternative filler material for through silicon vias (TSV) due to their high aspect ratio, attractive mechanical and thermal properties and high current carrying capability. Theoretically they can outperform Cu in terms of via resistance. Until now all CNT TSV reported in the literature were fabricated using electrically isolating catalyst support layers. In this work we demonstrate the growth of CNT with aspect ratios up to 35 on electrically conductive ZrN layers. This was used to fabricate the first CNT TSV which are directly contacted by metal thin-films on both sides of the CNT bundle, instead of resorting to the use of probe needles.
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