模拟AlGaN/GaN异质结构中的2DEG电荷

G. Longobardi, F. Udrea, S. Sque, J. Croon, F. Hurkx, E. Napoli, J. Sonsky
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引用次数: 9

摘要

在本文中,我们比较了计算AlGaN/GaN hemt 2DEG层电荷密度的不同方法。使用的方法是(i)在MATLAB中实现的分析理论,(ii)使用半导体TCAD软件进行的有限元分析,该软件仅实现泊松方程和连续性方程,以及(iii)自一致地解决泊松方程和Schrödinger方程的1D软件。通过使用一维Poisson-Schrödinger求解器,我们强调了忽略Schrödinger方程的后果。我们得出的结论是,TCAD模拟器以合理的精度预测了传统HEMT结构和具有额外GaN帽层的HEMT结构的2DEG层中的电子密度。此外,虽然加入Schrödinger对薄片电荷密度没有显著影响,但发现其在通道中的约束被改变。
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Modelling 2DEG charges in AlGaN/GaN heterostructures
In this paper we compare different approaches to calculating the charge density in the 2DEG layer of AlGaN/GaN HEMTs. The methods used are (i) analytical theory implemented in MATLAB, (ii) finite-element analysis using semiconductor TCAD software that implements only the Poisson and continuity equations, and (iii) 1D software that solves the Poisson and Schrödinger equations self-consistently. By using the 1D Poisson-Schrödinger solver, we highlight the consequences of neglecting the Schrödinger equation. We conclude that the TCAD simulator predicts with a reasonable level of accuracy the electron density in the 2DEG layer for both a conventional HEMT structure and one featuring an extra GaN cap layer. In addition, while the sheet charge density is not significantly affected by including Schrödinger, its confinement in the channel is found to be modified.
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