同轴几何碳纳米管场效应管的研究

P. Vimala, Likith Krishna L, Krishnan Maheshwari, S. Sharma
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引用次数: 2

摘要

本文旨在研究碳纳米管场效应晶体管(CNTFET)的行为,它是纳米电子器件之一,是互补金属氧化物半导体(CMOS)和mosfet的主要替代品,它们具有广泛的短通道效应,在其缺点中起着突出的作用,因此使我们今天寻找更好的器件。其中一个这样的器件是CNTFET,它在执行方面具有较好的低功耗,更快的开关速度,高载波迁移率和非常大规模的集成电路。该晶体管的通道被碳纳米管包围,本文主要围绕其电流-电压(I - V)特性进行仿真。该器件的效率总体上取决于CNTFET模拟中显示的器件参数,并且该器件的几何形状对载流子输运具有极好的优势,并且当栅极接触包裹在碳纳米管的整个通道中时,允许优越的静电。用于同轴几何的碳纳米管具有之字形结构,本质上是半导体的。作为纳米电子器件的重要组成部分,手性因子(n, m)的取值对漏极电流的影响至关重要。此外,还检查了影响漏极电流的源极/漏极掺杂电平变化。此外,还研究了不同温度条件下的I - V特性,这间接地使我们了解了该器件中电子随温度变化的运动情况。此外,还分析了纳米管长度、同轴栅极电压和栅极厚度对I - V特性的影响,并揭示了高k材料的影响
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Investigation of Carbon Nanotube FET with Coaxial Geometry
This paper aims to study the behavior of a Carbon Nanotube Field Effect Transistor (CNTFET) which is one of the nanoelectronic devices and a major replacement for Complementary Metal Oxide Semiconductor (CMOS) and MOSFETs, which have a wide range of short channel effects that play a prominent role in their disadvantages and, thus, have made us today to look for a better device. One such device is CNTFET which is better in terms of execution with low power consumption, faster switching speed, high carrier mobility, and very large scale integrated circuits. The channel of this transistor is surrounded by a carbon nanotube, and this paper mainly revolves around the simulation of its current-voltage ( I - V ) characteristics. The efficiency of this device on the whole depends on device parameters that are shown in the simulation of CNTFET, and the geometry of this device has an excellent dominance on carrier transport and permits for superior electrostatics while the gate contact wraps throughout the channel of a carbon nanotube. A carbon nanotube used for coaxial geometry has a zigzag structure and is semiconducting in nature. To ensure the efficient execution of CNTFETs as a vital part of nanoelectronic devices, chirality factor ( n , m ) values play an important role whose effect is shown on drain current. Further, the source/drain doping level variations that affect drain current are inspected. Also, I - V characteristics at different temperature conditions are examined which indirectly gives us an idea of the movement of electrons in this device with respect to change in temperature. Additionally, the analysis is also made to see the effect of nanotube length, coaxial gate voltage and gate thickness on I - V characteristics and also to reveal the impact of high-k materials
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