利用透射和反射光谱测定半导体异质结构光学参数n和κ的特性

A. Kovalyov
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引用次数: 0

摘要

在λ = 900 ~ 1200nm波长范围内,发现了基于In0.2Ga0.8As/GaAs量子阱的异质结构薄膜的折射率n和消光系数κ的光谱依赖性。在光谱的每个点上发现的n和κ的值提供了目标函数的最小值,该目标函数是GaAs衬底上生长的样品的计算反射和透射系数与测量反射和透射系数之差的模块之和。
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Peculiarities of Determination of the Optical Parameters (n and κ) of a Semiconductor Heterostructure from Transmission and Reflection Spectra
In the wavelength range λ = 900–1200 nm, the spectral dependences of the refractive index n and extinction coefficient κ of a thin film, which is the heterostructure based on In0.2Ga0.8As/GaAs quantum wells, are found. The values of n and κ found at each point of the spectrum provide the minimum of the objective function, which is the sum of the module of the differences between the calculated reflection and transmission coefficients and the measured reflection and transmission coefficients of the sample grown on the GaAs substrate.
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CiteScore
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