射频溅射制备Si: SiO2薄膜的退火效果及光学性能

K. Tanaka, N. Happo, M. Fujiwara
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引用次数: 1

摘要

我们制备了Si: SiO2薄膜,并利用光致发光光谱分析了其光学特性。Si: SiO2薄膜是通过溅射Si片(15 mm平方)在SiO2靶材(108 mm直径)上沉积而成的。利用He-Cd激光激发,薄膜发出光致发光。在室温下,肉眼可以看到蓝色的辐射。在400 ~ 1100 nm范围内测量的光致发光光谱宽且连续,有一些峰。退火后,光致发光减弱,颜色变为红色。
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Annealing effects and optical properties of Si: SiO2 films prepared by radio frequency sputter
We fabricated Si: SiO2 films and assessed its optical characteristics using photoluminescence spectroscopy. The Si: SiO2 films were deposited by sputtering Si tablets (15 mm square) onto a SiO2 target (108 mm diameter). Using excitation by a He-Cd laser, photoluminescence was emitted from the films. The bluish color emission was seen by the naked eye at room temperature. Photoluminescence spectra, that were measured from 400 nm to 1100 nm, were wide and continuous with some peaks. After annealing, that emission of photoluminescence decreased and its color changed to red.
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