制备方法对氧化铋薄膜形态结构和光学性能的影响

2014 International Semiconductor Conference (CAS) Pub Date : 2014-10-01 DOI:10.1109/SMICND.2014.6966394

S. Condurache-Bota, C. Constantinescu, M. Praisler, R. Gavrila, N. Țigău, C. Gheorghieș

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引用次数: 1

摘要

研究了氧化铋薄膜。比较了两种氧化方法:空气热氧化法和氧气氛脉冲激光烧蚀法。结果表明，与热氧化法制备的薄膜相比，pld法制备的薄膜结构更简单，形貌更均匀，折射率略低。

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Influence of the preparation method on the morpho-structural and optical properties of bismuth oxide thin films

Bismuth oxide thin films are investigated. Two oxidation methods are compared: thermal oxidation in air and pulsed laser ablation (PLD) in oxygen atmosphere of bismuth targets, respectively. It is found that PLD-prepared films have simpler structure, more uniform morphology and slightly lower refractive index than those prepared by thermal oxidation.

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2014 International Semiconductor Conference (CAS)

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