A. Rohatgi, R. Sudharsanan, S.A. Ringel, M.H. MacDougal
{"title":"高效太阳能电池用CdTe和CdZnTe多晶薄膜的生长和工艺优化","authors":"A. Rohatgi, R. Sudharsanan, S.A. Ringel, M.H. MacDougal","doi":"10.1016/0379-6787(91)90043-O","DOIUrl":null,"url":null,"abstract":"<div><p>Polycrystalline CdTe solar cells with efficiencies of approximately 10% were achieved by metal organic chemical vapor deposition growth of CdTe on glass/SnO<sub>2</sub>/CdS substrates. An <em>in situ</em> pre-heat treatment of the CdS substrate at 450 °C in an H<sub>2</sub> ambient was found to be essential for high performance devices because it removes oxygen-related defects on the CdS surface. This heat treatment also results in a cadmium-deficient CdS surface which may, in part, limit the CdTe cell efficiency to 10% owing to cadmium vacancy related interface defects. The CdCl<sub>2</sub> treatment used in CdTe cell processing was found to promote grain growth, reduce series resistance and interface state density, and change to dominant current transport mechanism from thermally assisted tunneling and recombination via interface states to recombination in the depletion region. These beneficial effects resulted in an increase in the CdTe/CdS cell efficiency from around 2% to approximately 9%. In addition to the CdTe cells, polycrystalline 1.7 eV CdZnTe films were grown by molecular beam epitaxy for tandem cell applications. CdZnTe/CdS cells processed using the standard CdTe cell fabrication procedure resulted in 4.4% efficiency, high series resistance, and a band gap shift to 1.55 eV. Formation of ZnO at and near the CdZnTe surface was found to be the source of high contact resistance. A saturated dichromate etch instead of the Br<sub>2</sub>:CH<sub>3</sub>OH etch prior to contact deposition was found to solve the contact resistance problem. The CdCl<sub>2</sub> treatment was identified to be the cause of the observed band gap shift owing to the preferred formation of ZnCl<sub>2</sub>. A model for the band gap shift along with a possible solution using an overpressure of ZnCl<sub>2</sub> in the annealing ambient is proposed. Development of a sintering aid which promotes grain growth and preserves the optimum 1.7 eV band gap is shown to be the key successful wide gap CdZnTe cells.</p></div>","PeriodicalId":101172,"journal":{"name":"Solar Cells","volume":"30 1","pages":"Pages 109-122"},"PeriodicalIF":0.0000,"publicationDate":"1991-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0379-6787(91)90043-O","citationCount":"64","resultStr":"{\"title\":\"Growth and process optimization of CdTe and CdZnTe polycrystalline films for high efficiency solar cells\",\"authors\":\"A. Rohatgi, R. Sudharsanan, S.A. Ringel, M.H. MacDougal\",\"doi\":\"10.1016/0379-6787(91)90043-O\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Polycrystalline CdTe solar cells with efficiencies of approximately 10% were achieved by metal organic chemical vapor deposition growth of CdTe on glass/SnO<sub>2</sub>/CdS substrates. An <em>in situ</em> pre-heat treatment of the CdS substrate at 450 °C in an H<sub>2</sub> ambient was found to be essential for high performance devices because it removes oxygen-related defects on the CdS surface. This heat treatment also results in a cadmium-deficient CdS surface which may, in part, limit the CdTe cell efficiency to 10% owing to cadmium vacancy related interface defects. The CdCl<sub>2</sub> treatment used in CdTe cell processing was found to promote grain growth, reduce series resistance and interface state density, and change to dominant current transport mechanism from thermally assisted tunneling and recombination via interface states to recombination in the depletion region. These beneficial effects resulted in an increase in the CdTe/CdS cell efficiency from around 2% to approximately 9%. In addition to the CdTe cells, polycrystalline 1.7 eV CdZnTe films were grown by molecular beam epitaxy for tandem cell applications. CdZnTe/CdS cells processed using the standard CdTe cell fabrication procedure resulted in 4.4% efficiency, high series resistance, and a band gap shift to 1.55 eV. Formation of ZnO at and near the CdZnTe surface was found to be the source of high contact resistance. A saturated dichromate etch instead of the Br<sub>2</sub>:CH<sub>3</sub>OH etch prior to contact deposition was found to solve the contact resistance problem. The CdCl<sub>2</sub> treatment was identified to be the cause of the observed band gap shift owing to the preferred formation of ZnCl<sub>2</sub>. A model for the band gap shift along with a possible solution using an overpressure of ZnCl<sub>2</sub> in the annealing ambient is proposed. Development of a sintering aid which promotes grain growth and preserves the optimum 1.7 eV band gap is shown to be the key successful wide gap CdZnTe cells.</p></div>\",\"PeriodicalId\":101172,\"journal\":{\"name\":\"Solar Cells\",\"volume\":\"30 1\",\"pages\":\"Pages 109-122\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1991-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0379-6787(91)90043-O\",\"citationCount\":\"64\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Solar Cells\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/037967879190043O\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solar Cells","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/037967879190043O","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 64
摘要
在玻璃/SnO2/CdS衬底上通过金属有机化学气相沉积生长CdTe,获得了效率约10%的多晶CdTe太阳能电池。在450°C的H2环境中对CdS衬底进行原位预处理对于高性能器件是必不可少的,因为它可以去除CdS表面上与氧相关的缺陷。这种热处理也会导致cd表面缺乏镉,这可能部分地限制了CdTe电池效率到10%,因为镉空位相关的界面缺陷。研究发现,CdCl2处理可以促进CdTe电池的晶粒生长,降低串联电阻和界面态密度,并使主导的电流传递机制从热辅助隧道和界面态重组转变为耗尽区重组。这些有利的影响导致CdTe/CdS电池的效率从大约2%增加到大约9%。除了CdTe电池外,还采用分子束外延法生长了多晶1.7 eV CdZnTe薄膜,用于串联电池的应用。采用标准CdTe电池制造工艺加工的CdZnTe/CdS电池效率为4.4%,串联电阻高,带隙位移为1.55 eV。发现在CdZnTe表面及其附近形成ZnO是高接触电阻的来源。用饱和重铬酸盐蚀刻代替接触沉积前的Br2:CH3OH蚀刻,解决了接触电阻问题。由于ZnCl2优先形成,CdCl2处理被确定为观察到的带隙移动的原因。提出了一个带隙位移的模型,以及在退火环境中使用ZnCl2超压的可能解决方案。开发一种促进晶粒生长并保持最佳1.7 eV带隙的助烧剂是成功制备宽间隙CdZnTe电池的关键。
Growth and process optimization of CdTe and CdZnTe polycrystalline films for high efficiency solar cells
Polycrystalline CdTe solar cells with efficiencies of approximately 10% were achieved by metal organic chemical vapor deposition growth of CdTe on glass/SnO2/CdS substrates. An in situ pre-heat treatment of the CdS substrate at 450 °C in an H2 ambient was found to be essential for high performance devices because it removes oxygen-related defects on the CdS surface. This heat treatment also results in a cadmium-deficient CdS surface which may, in part, limit the CdTe cell efficiency to 10% owing to cadmium vacancy related interface defects. The CdCl2 treatment used in CdTe cell processing was found to promote grain growth, reduce series resistance and interface state density, and change to dominant current transport mechanism from thermally assisted tunneling and recombination via interface states to recombination in the depletion region. These beneficial effects resulted in an increase in the CdTe/CdS cell efficiency from around 2% to approximately 9%. In addition to the CdTe cells, polycrystalline 1.7 eV CdZnTe films were grown by molecular beam epitaxy for tandem cell applications. CdZnTe/CdS cells processed using the standard CdTe cell fabrication procedure resulted in 4.4% efficiency, high series resistance, and a band gap shift to 1.55 eV. Formation of ZnO at and near the CdZnTe surface was found to be the source of high contact resistance. A saturated dichromate etch instead of the Br2:CH3OH etch prior to contact deposition was found to solve the contact resistance problem. The CdCl2 treatment was identified to be the cause of the observed band gap shift owing to the preferred formation of ZnCl2. A model for the band gap shift along with a possible solution using an overpressure of ZnCl2 in the annealing ambient is proposed. Development of a sintering aid which promotes grain growth and preserves the optimum 1.7 eV band gap is shown to be the key successful wide gap CdZnTe cells.