直流反应磁控溅射制备纳米ZrO2薄膜的表征

Venkataiah Sunke, Gopal Naik Bukke, U. Suda
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引用次数: 6

摘要

氧化锆(ZrO2)因其高透明度、热稳定性和机械强度而被称为氧化锆,是一种有前途的材料。具有四方结构的氧化锆具有较高的强度和断裂韧性。由于这些原因,氧化锆陶瓷在人体人工关节的摩擦学应用受到了广泛的关注。人造矫形材料的主要要求是通过在其表面形成生物活性骨样层与活骨良好结合高分子量聚乙烯杯形骨槽是临床应用于全髋关节假体头部的优良生物材料由于它的透明性,它也被用于制造高强度的牙种植体核。锆陶瓷在生物医学应用中发现了脆性氢氧磷灰石和生物玻璃的增韧和强化潜力。由于介电常数适中,它已被认为是下一代互补金属氧化物半导体(CMOS)器件中替代传统二氧化硅作为栅极介电介质的可能的高k介电候选材料高折射率和宽光学带隙使其成为有源光电器件、大功率激光器和发光二极管薄膜形式的ZrO2也用作电致变色器件和氧气传感器中的光子导体ZrO2薄膜的制备采用了锆膜热氧化、电子束蒸发、脉冲激光沉积、DC / RF磁控溅射、溶胶-凝胶法和喷雾热解等沉积方法。11-15本研究尝试用直流反应磁控溅射技术沉积方形结构的透明ZrO2薄膜。将沉积的ZrO2薄膜在450℃的固定温度下在空气中退火1小时。对沉积和退火后的ZrO2薄膜的化学成分、晶体结构和光学性能进行了表征,并报道了结果。材料与方法
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Characterisation of nanostructured ZrO2 thin films formed by DC reactive magnetron sputtering
Zirconium oxide (ZrO2) is also known as zirconia a promising material because of its high transparency, thermal stability and mechanical strength. Zirconium oxide with tetragonal structure show high strength and fracture toughness. Because of these reasons, zirconium oxide ceramics received much interest for tribological applications in human artificial joints. Main requirement for an artificial orthopaedic material is good binding with living bones through a formation of a biologically active bone like layer on its surface.1 It is an excellent biomaterial used as clinical application as heads of total hip prostheses by the combination of high molecular weight polyethylene cup sockets.2 It is also used in the fabrication of high strength core for dental implants due to its transparency.3,4 Zirconium ceramics find potential for toughening and strengthening of brittle hydro-oxyapatite and bioglass in biomedical applications.5,6 It has recognised as possible high-k dielectric candidate as an alternate to conventional silicon dioxide as gate dielectric in the next generation of complementary metal oxide semiconductor (CMOS) devices due to its moderate dielectric constant.7 High refractive index and wide optical band gap find it as active opto electron devices, high power laser and light emitting diodes.8 ZrO2 in thin film form also used as photon conductor in electro chromic devices9 and oxygen gas sensor.10 Various deposition methods namely thermal oxidation of zirconium films, electron beam evaporation, pulsed laser deposition, DC / RF magnetron sputtering, sol-gel process and spray pyrolysis were employed for preparation of ZrO2 thin films. 11–15 In this investigation, an attempt is made in the deposition of tetragonal structured and transparent ZrO2 thin films by DC reactive magnetron sputtering technique. The as-deposited ZrO2 thin films were annealed in air at a fixed temperature of 450oC for an hour. The as-deposited and annealed ZrO2 films were characterized for their chemical composition, crystallographic structure and optical properties and reported the results. Materials and methods
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