Sn3.0Ag0.5Cu/Sn58Bi结构复合焊料互连的电迁移行为

Fengjiang Wang, Lili Zhou, Xiaojing Wang
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引用次数: 0

摘要

研究了室温电流密度为1.0×104 A/cm2时Cu/Sn58Bi/Cu和Cu/Sn58Bi/ Sn3.0Ag0.5Cu/ Sn58Bi/Cu结构复合焊点中Bi和Sn的显微组织和电迁移规律。两种焊点在电流应力作用下,阳极侧和阴极侧的形貌都发生了变化。阳极侧形成Bi层,阴极侧形成Sn层。微量分析表明,铋是阴极向阳极扩散的主要元素,铋原子的迁移速度快于锡原子。此外,通过对两种焊点的比较,不难发现Sn3.0Ag0.5Cu在电迁移过程中抑制了原子Bi和原子Sn的迁移。
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Electromigration behavior of Sn3.0Ag0.5Cu/Sn58Bi structural composite solder interconnect
The microstructure and electromigration of Bi and Sn in Cu/Sn58Bi/Cu and Cu/Sn58Bi /Sn3.0Ag0.5Cu/ Sn58Bi/Cu structural composite solder joint, were researched under the current density of 1.0×104 A/cm2 at room temperature. Two kinds of solder joints changed their morphology at both anode sides and cathode sides after current stressing. Bi layer was formed in the anode side while Sn layer was formed in the cathode side. The microanalysis indicated that Bi was the major diffusion element from cathode to anode and the migration of atomic Bi was faster than atomic Sn. Furthermore, through the comparison of two kinds of solder joints, it was easy to find that Sn3.0Ag0.5Cu suppressed the migration of atomic Bi and atomic Sn during electromigration.
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