10ghz单晶掺钪氮化铝兰姆波谐振器

Mingyo Park, Zhijian Hao, D. Kim, A. Clark, R. Dargis, A. Ansari
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引用次数: 28

摘要

本文报道了基于单晶钪(Sc)掺杂氮化铝(AlN)薄膜的lamb波谐振器的首次演示,工作频率为8-10 GHz。采用分子束外延(MBE)技术在硅衬底上生长Sc-AlN和AlN薄膜。电极采用亚微米特征尺寸的电子束光刻技术定义,以最大化机电耦合系数$(k_t^2)$。据报道,在9.9 GHz时,$k_t^2$值高达4.8%,卸载质量因子(Qm)为185,产生$f \乘以{Q_m} \乘以k_t^2$值为74 GHz。高$k_t^2$是由于单晶性和sc掺杂提高了压电系数。这项工作表明,与5G滤波器应用所需的亚微米厚度溅射沉积薄膜相比,使用单晶Sc-AlN薄膜可以实现更高性能的谐振器。
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A 10 GHz Single-Crystalline Scandium-Doped Aluminum Nitride Lamb-Wave Resonator
This work reports on the first demonstration of Lamb-wave resonators based on single-crystalline Scandium (Sc)-doped Aluminum Nitride (AlN) films operating at 8-10 GHz. Sc-AlN and AlN films are grown on Silicon substrates using molecular beam epitaxy (MBE). The electrodes are defined using electron beam lithography with sub-micron feature sizes to maximize the electromechanical coupling coefficient$(k_t^2)$. A high $k_t^2$ value of 4.8 % is reported at 9.9 GHz, with unloaded Quality factor (Qm) of 185, yielding $f \times {Q_m} \times k_t^2$ values of 74 GHz. The high $k_t^2$ is attributed to enhanced piezoelectric coefficients achieved due to single crystallinity, as well as Sc-doping. This work demonstrates higher performance resonators achieved by using single-crystalline Sc-AlN thin films compared to sputter-deposited films with sub-micron thicknesses, required for 5G filter applications.
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