考虑BTI和工艺变化的逻辑电路尺寸优化技术

M. Yabuuchi, Kazutoshi Kobayashi
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引用次数: 3

摘要

在本文中,我们概述了一种考虑BTI(偏置温度不稳定性)和工艺变化的逻辑电路晶体管尺寸优化技术。我们用统计分析来证明结果的准确性。由于变化对缩放过程有很大的影响,可靠的电路设计应该包括定量分析,如果它们在未来变得更可靠。在这项研究中,我们使用了一种算法来证明,通过我们的技术,我们有效地将逻辑路径的时间裕度降低了4.4%,低于传统技术所达到的裕度。我们还观察到优化电路的寿命在没有任何面积开销的情况下延长。
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Size Optimization Technique for Logic Circuits that Considers BTI and Process Variations
In this paper we outline a transistor size optimization technique for logic circuits that takes into account BTI (Bias Temperature Instability) and process variations. We demonstrate the accuracy of our results with statistical analysis. Since variations have a large impact on the scaling process, dependable circuit designs should include a quantitative analysis if they are to become more reliable in the future. In this study we used an algorithm to prove that with our technique we efficiently lowered the timing margin of the logic path by 4.4% below the margin achieved by conventional techniques. We also observed that the lifetime of the optimized circuits extended without any area overhead.
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来源期刊
IPSJ Transactions on System LSI Design Methodology
IPSJ Transactions on System LSI Design Methodology Engineering-Electrical and Electronic Engineering
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1.20
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