光学薄镍膜暴露于氧气下的反射率变化

Sensors and Actuators Pub Date : 1989-09-01 Epub Date: 2002-01-30 DOI:10.1016/0250-6874(89)87077-5
M.A. Butler, A.J. Ricco
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引用次数: 15

摘要

当暴露于氧气中时,蒸发在光纤末端的光学薄镍薄膜显示出反射率的变化。这种效应已被测量为金属厚度和波长的函数。NiO在镍表面的生长减少了金属的厚度,从而减少了通过它的光的相移。这种相位变化引起反射率的变化。使用菲涅耳反射系数的简单经典模型可拟合所有数据。从光学测量中推断出的4.2 Å镍厚度减少与使用现代表面分析技术进行的测量结果非常吻合。这种用于监测吸附物和金属之间化学相互作用的新光学方法可能对气体传感和腐蚀监测有用。此外,它可以提供关于化学吸附如何改变金属态的局部电子密度的信息。
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Reflectivity changes of optically-thin nickel films exposed to oxygen

Optically-thin nickel films evaporated on the end of optical fibers show a reflectivity change when exposed to oxygen. This effect has been measured as a function of metal thickness and wavelength. Growth of NiO on the nickel surface reduces the thickness of the metal and thus the phase shift of the light passing through it. This phase change causes a change in the reflectivity. A simple classical model using Fresnel reflection coefficients fits all the data. The 4.2 Å reduction in nickel thickness deduced from the optical measurements agrees well with measurements made using modern surface analytical techniques. This new optical method for monitoring chemical interactions between adsorbates and metals may prove useful for gas sensing and corrosion monitoring. In addition, it may provide information on how chemisorption modifies the local electron density of states in metals.

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