{"title":"用于先进封装中铜键线的低成本、单步混合键/障膜","authors":"Qiran Xiao, Brian L. Watson, R. Dauskardt","doi":"10.1109/IITC-MAM.2015.7325656","DOIUrl":null,"url":null,"abstract":"The presence of weak Cu-oxides has detrimental implications for the adhesion, moisture sensitivity, stress-and electro-migration of Cu bondlines in advanced packaging, often leading to premature device failure. We report on a novel, low-cost, single-step sol-gel synthetic route capable of reducing the weak Cu-oxide while simultaneously depositing a high-performance hybrid film, which acts both as an adhesion layer at the Cu/epoxy interface, as well as potentially a barrier film that prevents moisture degradation and Cu stress- and electro-migration.","PeriodicalId":6514,"journal":{"name":"2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)","volume":"94 1","pages":"225-228"},"PeriodicalIF":0.0000,"publicationDate":"2015-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Low-cost, single-step hybrid bond/barrier films for Cu bondlines in advanced packaging\",\"authors\":\"Qiran Xiao, Brian L. Watson, R. Dauskardt\",\"doi\":\"10.1109/IITC-MAM.2015.7325656\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The presence of weak Cu-oxides has detrimental implications for the adhesion, moisture sensitivity, stress-and electro-migration of Cu bondlines in advanced packaging, often leading to premature device failure. We report on a novel, low-cost, single-step sol-gel synthetic route capable of reducing the weak Cu-oxide while simultaneously depositing a high-performance hybrid film, which acts both as an adhesion layer at the Cu/epoxy interface, as well as potentially a barrier film that prevents moisture degradation and Cu stress- and electro-migration.\",\"PeriodicalId\":6514,\"journal\":{\"name\":\"2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)\",\"volume\":\"94 1\",\"pages\":\"225-228\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-05-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IITC-MAM.2015.7325656\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC-MAM.2015.7325656","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Low-cost, single-step hybrid bond/barrier films for Cu bondlines in advanced packaging
The presence of weak Cu-oxides has detrimental implications for the adhesion, moisture sensitivity, stress-and electro-migration of Cu bondlines in advanced packaging, often leading to premature device failure. We report on a novel, low-cost, single-step sol-gel synthetic route capable of reducing the weak Cu-oxide while simultaneously depositing a high-performance hybrid film, which acts both as an adhesion layer at the Cu/epoxy interface, as well as potentially a barrier film that prevents moisture degradation and Cu stress- and electro-migration.