基于噪声优化的50nm门长变质HEMT技术的w波段LNA mmic

F. Thome, A. Leuther, F. Heinz, O. Ambacher
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引用次数: 16

摘要

本文介绍了采用两种不同工艺制作的两种w波段LNA mmic的设计、分析和室温性能。该研究表明,给定的50 nm栅长InGaAs mHEMT技术在减少必要漏极电流的情况下,噪声得到了改善。因此,设计、制作并表征了单端平衡w波段LNA MMIC。该放大器具有最先进的噪声温度,单端LNA的平均值为159 K (1.9 dB),最低值为132 K (1.6 dB)。由于技术研究,与参考技术相比,结合优越的MMIC良率,可以将噪声温度降低约15 K。
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W-Band LNA MMICs Based on a Noise-Optimized 50-nm Gate-Length Metamorphic HEMT Technology
In this paper, the design, analysis, and room-temperature performance of two W-band LNA MMICs fabricated in two different technology variations are presented. The investigation demonstrates the noise improvement of the given 50-nm gate-length InGaAs mHEMT technology with reduced necessary drain currents. Therefore, a single-ended and balanced W-band LNA MMIC were designed, fabricated, and characterized. The amplifiers exhibit state-of-the-art noise temperatures with an average value for the single-ended LNA of 159 K (1.9 dB) with lowest values of 132 K (1.6 dB). Due to the technology investigation it was possible to reduce the noise temperature by about 15 K compared to the reference technology in combination with superior MMIC yield.
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