退火温度调制对ZnSe薄膜结构和光学性能的影响

IF 1.5 4区 材料科学 Q3 CRYSTALLOGRAPHY Crystal Research and Technology Pub Date : 2021-03-22 DOI:10.1002/crat.202000177
Yafei Yuan, Chunmin Liu, Yaopeng Li, Jing Li
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引用次数: 0

摘要

研究了退火温度对ZnSe薄膜结构和光学性能的影响。样品是通过热蒸发技术制备的,部分沉积薄膜是退火的。X射线衍射图和拉曼光谱分析表明,ZnSe薄膜具有立方锌闪锌矿晶体结构,且结晶度随退火温度的升高而升高。对于线性光学参数,随着退火温度的升高,吸收边向短波长方向移动。基于斯瓦内普尔方法,确定了折射率、薄膜厚度、吸收系数和光学带隙。随着退火温度的升高,带隙值从2.63 eV增加到2.68 eV。通过对800 nm波长下的飞秒脉冲进行开孔径Z扫描技术,所有的ZnSe样品都表现出双光子吸收响应。随着退火温度的升高,调制深度和双光子吸收系数减小。此外,在较高的入射功率强度下,所有样品都表现出更好的光限制响应。这些新特性使其成为传统光电器件和光学限制器的有前途的材料。
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Influence of Annealing Temperature Modulation on the Structural and Optical Properties of ZnSe Thin Films
The research work is devoted to study the influence of annealing temperature on the structural and optical properties of ZnSe thin films. The samples are prepared by a thermal evaporation technique and part of the as‐deposited films are annealed. X‐ray diffraction patterns and Raman spectra analysis reveal that the ZnSe thin films have cubic zinc‐blende crystal structure and the crystallinity increases as the annealing temperature increases. For the linear optical parameters, the absorption edge moves to shorter wavelengths with the increase of annealing temperature. Based on Swanepoel's method, the refractive index, film thickness, absorption coefficient and optical band gap are determined. The values of band gap are found to increase from 2.63 to 2.68 eV as the annealing temperature increases. By performing an open aperture Z‐scan technique with femtosecond pulses under 800 nm wavelength, all ZnSe samples show two‐photon absorption responses. It is found that the modulation depth and the two‐photon absorption coefficient decrease with increasing annealing temperature. Moreover, all samples exhibit better optical limiting responses at higher incident power intensities. These novel properties render this a promising material for traditional optoelectronic devices and optical limiters.
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来源期刊
自引率
6.70%
发文量
121
审稿时长
1.9 months
期刊介绍: The journal Crystal Research and Technology is a pure online Journal (since 2012). Crystal Research and Technology is an international journal examining all aspects of research within experimental, industrial, and theoretical crystallography. The journal covers the relevant aspects of -crystal growth techniques and phenomena (including bulk growth, thin films) -modern crystalline materials (e.g. smart materials, nanocrystals, quasicrystals, liquid crystals) -industrial crystallisation -application of crystals in materials science, electronics, data storage, and optics -experimental, simulation and theoretical studies of the structural properties of crystals -crystallographic computing
期刊最新文献
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