气体放电XeF (B->X)激光器的改进

P. Peters, Q. Mei, W. Witteman
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引用次数: 0

摘要

近十年来,放电气体激光器技术有了很大的发展。高重复率的准分子激光器,工作功率为100-300瓦,目前已商品化。然而,对XeF (B→X)放电准分子激光器的电子束抽运跃迁进行了广泛的研究,但有关结果却很少。这当然与在相同泵浦条件下,与竞争的XeCl准分子激光器相比,NF3或F2掺杂激光气体混合物中放电不稳定性的可能性增加有关。随着新型强激励技术的应用,这些问题得到了解决。
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Improvements in a gas discharge XeF (B->X) laser
The technology of electrical discharge gas lasers has improved greatly in the last decade. High repetition rates excimer lasers with operating powers of 100-300 W are commercially available now. However results on the XeF (B→X) discharge excimer laser are scarce although e-beam pumping of this laser transition has been studied extensively. This certainly has to do with the increased probability of discharge instabilities in the NF3 or F2 doped laser gas mixtures compared to the HCl-doped gas mixtures for the competing XeCl excimer laser under the same pumping conditions. With the use of new and powerful excitation techniques these problems are addressed.
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