可靠的小间距RDL的钝化材料

Moreau Stéphane, N. Allouti, C. Ribiére, J. Charbonnier, D. Bouchu, J. Michel, N. Buffet, P. Chausse
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引用次数: 6

摘要

尽管聚合物在电子和微电子领域已经使用了几十年,但其主要缺点之一是易吸收水分。水分渗透到聚合物中会降低其机械和电气性能,因此,水分成为RDL水平的可靠性问题。本文的研究结果表明,除了选择合适的聚合物外,还需要选择合适的集成方案,以确保Cu RDL水平的稳定电性能。使用高温储存的可靠性研究表明,主要的水分扩散途径是通过聚合物本身,使用双层(无机/有机)作为钝化层似乎是最大限度地减少水分渗透的最佳选择。此外,由于Cu RDL水平上的电迁移现象,我们确定了晶界和Cu/SiN界面的失效模式。
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Passivation Materials for a Reliable Fine Pitch RDL
Even if polymers are used for decades in electronics and microelectronics, one of the primary drawbacks is their susceptibility to moisture uptake. Moisture penetrating into polymers reduces their mechanical and electrical performances and consequently, moisture becomes a reliability issue for the RDL level. This paper presents results which highlight the need of choosing the right integration scheme in addition to the right polymer to ensure steady electrical performances of the Cu RDL level. The reliability studies using high temperature storages demonstrate that the main moisture diffusion path is through the polymer itself and the use of a bilayer (inorganic/organic) as passivation layer seems to be the best choice to minimize the moisture permeation. In addition, we have identify the failure modes, due to the electromigration phenomenon in the Cu RDL level, as being the grain boundaries and the Cu/SiN interface.
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