Effect of Carrier Gas Flow Rates on the Structural and Optical Properties of ZnO Films Deposited Using an Aerosol Deposition Technique

Aerosol deposition (AD) is a simple, dry raw-powder deposition process in which the targeted film is formed by direct bombardment of accelerated starting powder onto the substrate surface at room temperature. Despite the increased interest in AD film formation, no work has been completed to systematically investigate the formation of dense zinc oxide (ZnO) films using the AD method and their optical properties. Therefore, this study was carried out to investigate the effect of AD gas flow rate on the formation of AD films and the optical properties of aerosol-deposited ZnO films. ZnO films with nanosized (<40 nm) crystallites were successfully deposited on FTO substrates at room temperature. A dense and uniform layer of aerosol-deposited ZnO films with a roughened surface was obtained without subsequent heat treatment. With the increase in the AD gas flow rate, the crystal size and the AD film’s thickness were reduced. The Raman spectroscopy verified that the thin film was of a ZnO wurtzite structure. The room temperature photoluminescence of the ZnO thin film produced strong visible emissions. The findings of this work demonstrated that AD can be an alternative technique for the rapid deposition of dense and thick ZnO films for optoelectronic applications.