{"title":"固定平均电流密度下铂电沉积速率和电流效率的温度依赖性","authors":"M. Saitou, S. Teruya, S. Hossain","doi":"10.2174/1876505X01103010001","DOIUrl":null,"url":null,"abstract":"We have investigated the formation of a platinum thin film from a simple solution of dihydrogen hexachloro- platinate in a low temperature range of 283 to 295 K by a pulse current technique. Despite the low temperature, the platinum thin film observed with a confocal laser scanning microscope does not comprise particle aggregates but dense layer with a small surface roughness that tends to saturate at an initial growth stage. The deposition rate and current efficiency at a fixed average current density are evidently dependent on temperature. The analysis of the mol weight of platinum deposit based on two electrochemical reactions proposed in platinum electrodeposition elucidates the tempera- ture dependence characterized by a thermal activation process.","PeriodicalId":23074,"journal":{"name":"The Open Electrochemistry Journal","volume":"101 1","pages":"1-5"},"PeriodicalIF":0.0000,"publicationDate":"2011-02-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Temperature-Dependence of Deposition Rate and Current Efficiency in Platinum Electrodeposition at a Fixed Average Current Density\",\"authors\":\"M. Saitou, S. Teruya, S. Hossain\",\"doi\":\"10.2174/1876505X01103010001\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have investigated the formation of a platinum thin film from a simple solution of dihydrogen hexachloro- platinate in a low temperature range of 283 to 295 K by a pulse current technique. Despite the low temperature, the platinum thin film observed with a confocal laser scanning microscope does not comprise particle aggregates but dense layer with a small surface roughness that tends to saturate at an initial growth stage. The deposition rate and current efficiency at a fixed average current density are evidently dependent on temperature. The analysis of the mol weight of platinum deposit based on two electrochemical reactions proposed in platinum electrodeposition elucidates the tempera- ture dependence characterized by a thermal activation process.\",\"PeriodicalId\":23074,\"journal\":{\"name\":\"The Open Electrochemistry Journal\",\"volume\":\"101 1\",\"pages\":\"1-5\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-02-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The Open Electrochemistry Journal\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.2174/1876505X01103010001\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Open Electrochemistry Journal","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2174/1876505X01103010001","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Temperature-Dependence of Deposition Rate and Current Efficiency in Platinum Electrodeposition at a Fixed Average Current Density
We have investigated the formation of a platinum thin film from a simple solution of dihydrogen hexachloro- platinate in a low temperature range of 283 to 295 K by a pulse current technique. Despite the low temperature, the platinum thin film observed with a confocal laser scanning microscope does not comprise particle aggregates but dense layer with a small surface roughness that tends to saturate at an initial growth stage. The deposition rate and current efficiency at a fixed average current density are evidently dependent on temperature. The analysis of the mol weight of platinum deposit based on two electrochemical reactions proposed in platinum electrodeposition elucidates the tempera- ture dependence characterized by a thermal activation process.