用残余气体分析仪研究JIPP T-II环面放电清洗过程

N. Noda, S. Hirokura, Y. Taniguchi, S. Tanahashi
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引用次数: 11

摘要

经过几个小时的放电清洗,可以观察到水蒸气分压的衰减时间从一个明确的值变化到另一个值。在后期阶段观察到的长衰变时间可以解释为氧化铬脱氧速度缓慢的结果,这可能是该阶段清洗过程的主要原因。讨论了清洗过程中电子密度的优化问题,并将水蒸气分压的密度依赖性实验结果与基于零维粒子平衡计算的结果进行了比较。发现有效清洗的关键之一是提高等离子体的电子密度,使水的解离损失率与粘着损失率一样大。在假定粘着概率为0.5左右的情况下,清洁的表面条件需要高达1011 cm−3的密度。
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Study of Discharge Cleaning Process in JIPP T-II Torus by Residual Gas Analyzer
After several hours of discharge cleaning, it has been observed that the decay time of the water‐vapor partial pressure changes from one well defined value to another. A long decay time observed in the later phase can be interpreted as a result of a slow deoxidization rate of chromium oxide, which may dominate the cleaning process in this phase. Optimization of the electron density for the cleaning is discussed, comparing the experimental results on density dependence of the water‐vapor partial pressure with a result based on a zero‐dimensional calculation for particle balance. One of the essential points for effective cleaning is found to be raising the electron density of the plasma high enough that the dissociation loss rate of H2O is as large as the sticking loss rate. A density as high as 1011 cm−3 is required for a clean surface condition where sticking probability is presumed to be around 0.5.
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