CIGS薄膜高功率脉冲磁控溅射(HiPIMS)的发射光谱研究

2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) Pub Date : 2014-10-16 DOI:10.1109/PVSC.2014.6925239

J. Olejníček, Z. Hubička, M. Kohout, P. Kšírová, M. Brunclíková, Š. Kment, M. Čada, S. Darveau, C. Exstrom

{"title":"CIGS薄膜高功率脉冲磁控溅射(HiPIMS)的发射光谱研究","authors":"J. Olejníček, Z. Hubička, M. Kohout, P. Kšírová, M. Brunclíková, Š. Kment, M. Čada, S. Darveau, C. Exstrom","doi":"10.1109/PVSC.2014.6925239","DOIUrl":null,"url":null,"abstract":"CuIn1-xGaxSe2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic precursors. Thin film characteristics were measured using X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectroscopy, energy-dispersive X-ray spectroscopy (EDX) and other techniques.","PeriodicalId":6649,"journal":{"name":"2014 IEEE 40th Photovoltaic Specialist Conference (PVSC)","volume":"8 1","pages":"1666-1669"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films\",\"authors\":\"J. Olejníček, Z. Hubička, M. Kohout, P. Kšírová, M. Brunclíková, Š. Kment, M. Čada, S. Darveau, C. Exstrom\",\"doi\":\"10.1109/PVSC.2014.6925239\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"CuIn1-xGaxSe2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic precursors. Thin film characteristics were measured using X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectroscopy, energy-dispersive X-ray spectroscopy (EDX) and other techniques.\",\"PeriodicalId\":6649,\"journal\":{\"name\":\"2014 IEEE 40th Photovoltaic Specialist Conference (PVSC)\",\"volume\":\"8 1\",\"pages\":\"1666-1669\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-10-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 IEEE 40th Photovoltaic Specialist Conference (PVSC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PVSC.2014.6925239\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE 40th Photovoltaic Specialist Conference (PVSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.2014.6925239","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 3

摘要

采用高功率脉冲磁控溅射(HiPIMS)或直流磁控管溅射Cu、In和Ga，制备了x = 0、0.28和1的CuIn1-xGaxSe2 (CIGS)薄膜，并在Ar+Se气氛中硒化。利用光学发射光谱(OES)监测金属前驱体溅射过程中HiPIMS和直流等离子体的差异。采用x射线衍射(XRD)、扫描电镜(SEM)、拉曼光谱(Raman spectroscopy)、能量色散x射线光谱(EDX)等技术对薄膜特性进行了测量。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

Optical emission spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS thin films

CuIn1-xGaxSe2 (CIGS) thin films with x = 0, 0.28 and 1 were prepared by the sputtering of Cu, In and Ga in HiPIMS (High Power Impulse Magnetron Sputtering) or DC magnetron and subsequently selenized in an Ar+Se atmosphere. Optical emission spectroscopy (OES) was used to monitor differences in HiPIMS and DC plasma during sputtering of metallic precursors. Thin film characteristics were measured using X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectroscopy, energy-dispersive X-ray spectroscopy (EDX) and other techniques.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2014 IEEE 40th Photovoltaic Specialist Conference (PVSC)

自引率

0.00%

发文量