大优值单晶ScAlN表面声波谐振器(Q × kµl²)

Zhijian Hao, Mingyo Park, D. Kim, A. Clark, R. Dargis, Haoshen Zhu, A. Ansari
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引用次数: 18

摘要

基于分子束外延(MBE)生长的单晶氮化铝(AlN)和氮化铝钪(ScAlN)的表面声波(SAW)谐振器与现有的基于硅衬底溅射压电层的表面声波谐振器相比,声学性能有了很大的提高。在AlN和ScAlN器件层的谐振腔中,由于更好的结晶度和钪掺杂,耦合系数$\左({k_t^2} \右)$分别高达5.0%和7.8%。这导致硅上SAW器件的优点$\左({Q \times k_t^2} \右)$高达5.4,这比以前在硅上使用溅射ScAlN的工作大了大约两倍,与在非硅衬底上的工作相当。
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Single Crystalline ScAlN Surface Acoustic Wave Resonators with Large Figure of Merit (Q × kₜ²)
Surface acoustic wave (SAW) resonators based on single crystalline aluminum nitride (AlN) and scandium aluminum nitride (ScAlN) grown by molecular beam epitaxy (MBE) demonstrated substantial improvement in acoustic performance compared to the state-of-art devices with sputtered piezoelectric layers on silicon substrates. High coupling coefficient $\left( {k_t^2} \right)$ up to 5.0% and 7.8% were found in resonators with AlN and ScAlN device layers, respectively, due to better crystallinity and scandium doping. This resulted in high figure of merits $\left( {Q \times k_t^2} \right)$ among SAW devices on silicon up to 5.4, which is about twice larger than the previous work using sputtered ScAlN on silicon and comparable to those on non-silicon substrates.
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