InGaAsP/InP量子脉冲和量子阱激光器损耗机制的量化

S. Schaefer, Ras-Jeevan K. Obhi, C. Valdivia, K. Hinzer, P. Poole, Jiaren Liu, Zhenguo Lu
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引用次数: 0

摘要

随着量子冲刺激光设计技术的成熟,有必要研究性能限制因素。我们在InGaAsP/ inp系统中模拟了单片脊波导量子冲刺(QDash)和量子阱(QW)激光器,以研究在高温下限制器件性能的机制。我们的发现与代表性装置获得的实验数据进行了比较。我们量化了不同温度下注入电流密度的主要损耗机制,并比较了QW和QDash结构的结果。我们发现器件之间的相对损耗贡献存在差异。在较高的温度下,我们发现俄歇复合是主要的损失机制。
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Quantifying Loss Mechanisms in InGaAsP/InP Quantum Dash and Quantum Well Lasers
As quantum dash laser designs gain technological maturity, there is a need to investigate performance limiting factors. We simulate monolithic ridge waveguide quantum dash (QDash) and quantum well (QW) lasers in the InGaAsP/InP-system to investigate the mechanisms limiting device performance at elevated temperatures. Our findings are compared to experimental data obtained for representative devices. We quantify dominant loss mechanisms as a function of injection current density at different temperatures and compare results for QW and QDash structures. We find a variation in relative loss contribution between devices. At higher temperatures we find Auger recombination emerging as the dominant loss mechanism.
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