非晶FeTaC薄膜的厚度依赖性表面形貌、磁性能和磁畴结构

C. Das, J. Das, Thiruvengadam Vijayabaskaran, S. Bedanta, A. Talapatra, J. Mohanty, P. Alagarsamy
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引用次数: 2

摘要

我们系统地研究了x= 5-100 nm的Fe80Ta8C12 (x nm)非晶薄膜的表面形貌、磁性能和磁畴结构。采用磁控溅射技术在室温下直接在热氧化硅衬底上制备的沉积薄膜均呈现非晶结构。结构研究表明,当x>10时,超薄膜中的岛状结构转变为连续结构。此外,平均表面粗糙度随x的增加而增加,但与x没有系统的依赖关系。室温磁性能表明,在x 97%、低矫顽力(HC 3.5 kA/m)和HS (>40 kA/m)和降低MR/MS(<45%)的情况下,观察到薄膜的顺磁性。磁畴研究表明,随着x的增加,由于在沉积过程中应力淬火导致有效磁各向异性的增强,磁畴由平面内磁化转变为致密条纹畴模式,并且证实了12本文章由计算机程序翻译,如有差异,请以英文原文为准。
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Thickness Dependent Surface Topography, Magnetic Properties and Magnetic Domain Structure of Amorphous FeTaC Thin Films
We report systematic investigation of thickness dependent surface topography, magnetic properties and magnetic domain structures of amorphous Fe80Ta8C12 (x nm) films with x=5–100 nm. All the as-deposited films fabricated directly on thermally oxidized Si substrate at ambient temperature using magnetron sputtering technique exhibit amorphous structure. The structural studies reveal that island-like structure in ultra-thin films transforms into continuous one with increasing x>10. In addition, the average surface roughness increases with increasing x, but without any systematic dependency on x. Room temperature magnetic properties illustrate that the paramagnetic nature observed for films with x 97%), low coercivity (HC 3.5 kA/m) and HS (>40 kA/m) and reduced MR/MS (<45%). The magnetic domain studies not only reveal that the domains change from in-plane magnetization to dense stripe domain pattern with increasing x due to enhancement of effective magnetic anisotropy caused by stress quenched in during deposition, but also confirm that films with 12
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