激光波长变化对热蒸发法制备激光退火CdTe薄膜的影响

N. Khan, K. S. Rahman, T. H. Chowdhury, K. Sopian, A. Ali, M. Alam, N. Amin
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引用次数: 2

摘要

本文研究了两种不同波长CdTe薄膜的激光退火。在28A的沉积电流下热蒸发生长CdTe薄膜,然后在532nm(绿)和1064nm + 532nm(红外+绿)两种不同波长下进行沉积后激光退火。其他参数如激光输出能量、阶段速度和脉冲重复率保持固定。采用XRD、AFM、UV-Vis和霍尔效应测量系统进行了分析。XRD分析表明,所有薄膜均为多晶。AFM结果表明,激光退火对薄膜的Sq粗糙度没有显著影响。紫外可见光谱分析表明,激光退火后薄膜的带隙发生了显著变化,“T1”和“T2”的体积浓度发生了轻微变化。FESEM图像显示了激光退火后CdTe薄膜晶粒尺寸的变化。
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Influence of laser wavelength variation on the laser annealed CdTe thin films grown by thermal evaporation
Laser annealing of CdTe thin films with two different wavelengths has been studied in this work. The CdTe thin films were grown by thermal evaporation at a deposition current of 28A and then subjected to post deposition laser annealing at two different wavelengths of 532nm (green) and 1064nm + 532nm (infrared + green). The other parameters like laser output energy, stage velocity and pulse repetition rate were kept fixed. The analyses were carried out using XRD, AFM, UV-Vis and Hall Effect Measurement system. XRD showed polycrystalline nature for all the films. AFM revealed that laser annealing didn't change the `Sq' roughness of the films significantly. The UV-Vis analysis depicted significant changes in band gap for both the laser annealed films, `T1' and `T2' on the other hand bulk concentration changed slightly upon laser annealing. FESEM images revealed the change in grain size when laser annealing was done on the CdTe thin films.
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