L. Sirbu, L. Ghimpu, R. Muller, I. Voda, I. Tiginyanu, V. Ursaki, T. Dascălu
{"title":"疏水氧化锌用于EWOD技术和SAW器件,以获得更好的生物流体滑移AT微通道壁,由直流脉冲控制","authors":"L. Sirbu, L. Ghimpu, R. Muller, I. Voda, I. Tiginyanu, V. Ursaki, T. Dascălu","doi":"10.1109/SMICND.2012.6400645","DOIUrl":null,"url":null,"abstract":"In this paper, we will review the electrowetting on dielectric (EWOD) principles applied to microfluidic devices. We replaced the usually used teflon surface by ZnO transparent film in order to obtain a device with an optical weak absorption in the diapason ranged from VIS to far-MIR and THz waves. We studied the piezoelectric characteristics of ZnO films obtained by RF magnetron sputtering in Ar+O2 plasma. ZnO films have been grown on SiO2/Si(100) substrate using a zinc oxide target. The morphological characteristics of the films were investigated by atomic force microscopy (AFM). We present the THz spectra from ZnO films.","PeriodicalId":9628,"journal":{"name":"CAS 2012 (International Semiconductor Conference)","volume":"25 1","pages":"231-234"},"PeriodicalIF":0.0000,"publicationDate":"2012-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Hydrophobic ZnO used in EWOD technology and SAW devices for better bio-fluid slip AT microchannel walls controlled by DC pulses\",\"authors\":\"L. Sirbu, L. Ghimpu, R. Muller, I. Voda, I. Tiginyanu, V. Ursaki, T. Dascălu\",\"doi\":\"10.1109/SMICND.2012.6400645\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we will review the electrowetting on dielectric (EWOD) principles applied to microfluidic devices. We replaced the usually used teflon surface by ZnO transparent film in order to obtain a device with an optical weak absorption in the diapason ranged from VIS to far-MIR and THz waves. We studied the piezoelectric characteristics of ZnO films obtained by RF magnetron sputtering in Ar+O2 plasma. ZnO films have been grown on SiO2/Si(100) substrate using a zinc oxide target. The morphological characteristics of the films were investigated by atomic force microscopy (AFM). We present the THz spectra from ZnO films.\",\"PeriodicalId\":9628,\"journal\":{\"name\":\"CAS 2012 (International Semiconductor Conference)\",\"volume\":\"25 1\",\"pages\":\"231-234\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"CAS 2012 (International Semiconductor Conference)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.2012.6400645\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"CAS 2012 (International Semiconductor Conference)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2012.6400645","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Hydrophobic ZnO used in EWOD technology and SAW devices for better bio-fluid slip AT microchannel walls controlled by DC pulses
In this paper, we will review the electrowetting on dielectric (EWOD) principles applied to microfluidic devices. We replaced the usually used teflon surface by ZnO transparent film in order to obtain a device with an optical weak absorption in the diapason ranged from VIS to far-MIR and THz waves. We studied the piezoelectric characteristics of ZnO films obtained by RF magnetron sputtering in Ar+O2 plasma. ZnO films have been grown on SiO2/Si(100) substrate using a zinc oxide target. The morphological characteristics of the films were investigated by atomic force microscopy (AFM). We present the THz spectra from ZnO films.