Process, Voltage, and Temperature Aware Analysis of ISCAS C17 Benchmark Circuit

High leakage currents such as sub-threshold leakage, junction leakage, and gate leakage currents have become prominent sources of power consumption in CMOS VLSI circuits due to rapid technology scaling in the nanometer regimen accompanied by supply voltage reduction. Consequently, in the nanometer regime, it is imperative to estimate and reduce leakage capacity. However, this continuous aggressive scaling makes the CMOS circuits more prone to Process, Voltage, and Temperature (PVT) variations at nanometer technologies. This paper explores a systematic analysis of various leakage power reduction techniques at the circuit level, such as Power Gating (PG), Drain Gating (DG), LECTOR and GALEOR, and analyzes the effect of PVT variations on the dissipation and delay of leakage power using the ISCAS C17 benchmark circuit.