S. Matsuyama, K. Ishii, S. Suzuki, A. Terakawa, M. Fujiwara, S. Koshio, S. Toyama, S. Ito, M. Fujisawa, T. Nagaya
{"title":"大电流微束系统的研制","authors":"S. Matsuyama, K. Ishii, S. Suzuki, A. Terakawa, M. Fujiwara, S. Koshio, S. Toyama, S. Ito, M. Fujisawa, T. Nagaya","doi":"10.1142/S0129083514400038","DOIUrl":null,"url":null,"abstract":"We report on the development of a high-current microbeam system for wavelength-dispersive X-ray micro particle-induced X-ray emission (WDX-μ-PIXE) for chemical state mapping. The microbeam system is composed of two slits and a quadrupole doublet lens mounted on a heavy rigid support. The microbeam system is installed immediately after a switching magnet. A beam brightness of 2.4 pA⋅μm−2⋅mrad−2⋅MeV−1 is obtained at a half-divergence of 0.1 mrad. A beam current of more than 300 pA is obtained for object sizes of 40×10 μm2 with a half-divergence of 0.2 mrad, which corresponds to a beam spot size of 1×1 μm2. The calculated spot size of the beam was 1×1 μm2 and the measured spot size was 1×1.5 μm2. The WDX-μ-PIXE system with the microbeam system is now operational.","PeriodicalId":14345,"journal":{"name":"International Journal of PIXE","volume":"3 1","pages":"101-110"},"PeriodicalIF":0.0000,"publicationDate":"2014-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Development of a high-current microbeam system\",\"authors\":\"S. Matsuyama, K. Ishii, S. Suzuki, A. Terakawa, M. Fujiwara, S. Koshio, S. Toyama, S. Ito, M. Fujisawa, T. Nagaya\",\"doi\":\"10.1142/S0129083514400038\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report on the development of a high-current microbeam system for wavelength-dispersive X-ray micro particle-induced X-ray emission (WDX-μ-PIXE) for chemical state mapping. The microbeam system is composed of two slits and a quadrupole doublet lens mounted on a heavy rigid support. The microbeam system is installed immediately after a switching magnet. A beam brightness of 2.4 pA⋅μm−2⋅mrad−2⋅MeV−1 is obtained at a half-divergence of 0.1 mrad. A beam current of more than 300 pA is obtained for object sizes of 40×10 μm2 with a half-divergence of 0.2 mrad, which corresponds to a beam spot size of 1×1 μm2. The calculated spot size of the beam was 1×1 μm2 and the measured spot size was 1×1.5 μm2. The WDX-μ-PIXE system with the microbeam system is now operational.\",\"PeriodicalId\":14345,\"journal\":{\"name\":\"International Journal of PIXE\",\"volume\":\"3 1\",\"pages\":\"101-110\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal of PIXE\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1142/S0129083514400038\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of PIXE","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/S0129083514400038","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
We report on the development of a high-current microbeam system for wavelength-dispersive X-ray micro particle-induced X-ray emission (WDX-μ-PIXE) for chemical state mapping. The microbeam system is composed of two slits and a quadrupole doublet lens mounted on a heavy rigid support. The microbeam system is installed immediately after a switching magnet. A beam brightness of 2.4 pA⋅μm−2⋅mrad−2⋅MeV−1 is obtained at a half-divergence of 0.1 mrad. A beam current of more than 300 pA is obtained for object sizes of 40×10 μm2 with a half-divergence of 0.2 mrad, which corresponds to a beam spot size of 1×1 μm2. The calculated spot size of the beam was 1×1 μm2 and the measured spot size was 1×1.5 μm2. The WDX-μ-PIXE system with the microbeam system is now operational.