Joohoon Kim, Junhwa Seong, Wonjoong Kim, Gun-Yeal Lee, Seokwoo Kim, Hongyoon Kim, Seong-Won Moon, Dong Kyo Oh, Younghwan Yang, Jeonghoon Park, Jaehyuck Jang, Yeseul Kim, Minsu Jeong, Chanwoong Park, Hojung Choi, Gyoseon Jeon, Kyung-il Lee, Dong Hyun Yoon, Namkyoo Park, Byoungho Lee, Heon Lee, Junsuk Rho
{"title":"可扩展制造用于可见光下超光子学的高指数原子层-聚合物混合超表面","authors":"Joohoon Kim, Junhwa Seong, Wonjoong Kim, Gun-Yeal Lee, Seokwoo Kim, Hongyoon Kim, Seong-Won Moon, Dong Kyo Oh, Younghwan Yang, Jeonghoon Park, Jaehyuck Jang, Yeseul Kim, Minsu Jeong, Chanwoong Park, Hojung Choi, Gyoseon Jeon, Kyung-il Lee, Dong Hyun Yoon, Namkyoo Park, Byoungho Lee, Heon Lee, Junsuk Rho","doi":"10.1038/s41563-023-01485-5","DOIUrl":null,"url":null,"abstract":"Metalenses are attractive alternatives to conventional bulky refractive lenses owing to their superior light-modulating performance and sub-micrometre-scale thicknesses; however, limitations in existing fabrication techniques, including high cost, low throughput and small patterning area, have hindered their mass production. Here we demonstrate low-cost and high-throughput mass production of large-aperture visible metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography. Once a 12″ master stamp is imprinted, hundreds of centimetre-scale metalenses can be fabricated using a thinly coated high-index film to enhance light confinement, resulting in a substantial increase in conversion efficiency. As a proof of concept, an ultrathin virtual reality device created with the printed metalens demonstrates its potential towards the scalable manufacturing of metaphotonic devices. The authors propose a method for the scalable manufacturing of metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography, opening a route towards their low-cost, high-throughput mass production.","PeriodicalId":19058,"journal":{"name":"Nature Materials","volume":null,"pages":null},"PeriodicalIF":37.2000,"publicationDate":"2023-03-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"19","resultStr":"{\"title\":\"Scalable manufacturing of high-index atomic layer–polymer hybrid metasurfaces for metaphotonics in the visible\",\"authors\":\"Joohoon Kim, Junhwa Seong, Wonjoong Kim, Gun-Yeal Lee, Seokwoo Kim, Hongyoon Kim, Seong-Won Moon, Dong Kyo Oh, Younghwan Yang, Jeonghoon Park, Jaehyuck Jang, Yeseul Kim, Minsu Jeong, Chanwoong Park, Hojung Choi, Gyoseon Jeon, Kyung-il Lee, Dong Hyun Yoon, Namkyoo Park, Byoungho Lee, Heon Lee, Junsuk Rho\",\"doi\":\"10.1038/s41563-023-01485-5\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Metalenses are attractive alternatives to conventional bulky refractive lenses owing to their superior light-modulating performance and sub-micrometre-scale thicknesses; however, limitations in existing fabrication techniques, including high cost, low throughput and small patterning area, have hindered their mass production. Here we demonstrate low-cost and high-throughput mass production of large-aperture visible metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography. Once a 12″ master stamp is imprinted, hundreds of centimetre-scale metalenses can be fabricated using a thinly coated high-index film to enhance light confinement, resulting in a substantial increase in conversion efficiency. As a proof of concept, an ultrathin virtual reality device created with the printed metalens demonstrates its potential towards the scalable manufacturing of metaphotonic devices. The authors propose a method for the scalable manufacturing of metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography, opening a route towards their low-cost, high-throughput mass production.\",\"PeriodicalId\":19058,\"journal\":{\"name\":\"Nature Materials\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":37.2000,\"publicationDate\":\"2023-03-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"19\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nature Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.nature.com/articles/s41563-023-01485-5\",\"RegionNum\":1,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nature Materials","FirstCategoryId":"88","ListUrlMain":"https://www.nature.com/articles/s41563-023-01485-5","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
Scalable manufacturing of high-index atomic layer–polymer hybrid metasurfaces for metaphotonics in the visible
Metalenses are attractive alternatives to conventional bulky refractive lenses owing to their superior light-modulating performance and sub-micrometre-scale thicknesses; however, limitations in existing fabrication techniques, including high cost, low throughput and small patterning area, have hindered their mass production. Here we demonstrate low-cost and high-throughput mass production of large-aperture visible metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography. Once a 12″ master stamp is imprinted, hundreds of centimetre-scale metalenses can be fabricated using a thinly coated high-index film to enhance light confinement, resulting in a substantial increase in conversion efficiency. As a proof of concept, an ultrathin virtual reality device created with the printed metalens demonstrates its potential towards the scalable manufacturing of metaphotonic devices. The authors propose a method for the scalable manufacturing of metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography, opening a route towards their low-cost, high-throughput mass production.
期刊介绍:
Nature Materials is a monthly multi-disciplinary journal aimed at bringing together cutting-edge research across the entire spectrum of materials science and engineering. It covers all applied and fundamental aspects of the synthesis/processing, structure/composition, properties, and performance of materials. The journal recognizes that materials research has an increasing impact on classical disciplines such as physics, chemistry, and biology.
Additionally, Nature Materials provides a forum for the development of a common identity among materials scientists and encourages interdisciplinary collaboration. It takes an integrated and balanced approach to all areas of materials research, fostering the exchange of ideas between scientists involved in different disciplines.
Nature Materials is an invaluable resource for scientists in academia and industry who are active in discovering and developing materials and materials-related concepts. It offers engaging and informative papers of exceptional significance and quality, with the aim of influencing the development of society in the future.