The Total Dose Radiation Hardened MOSFET with Good High-temperatue Performance

Jianbing Cheng, Bo Zhang, Zhaoji Li
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引用次数: 1

Abstract

Total dose radiation hardened partial silicon-on-insulator (PSOI) MOSFET structure is proposed in this paper. Radiation effects of SOI and PSOI MOSFET are discussed and compared. Simulation results show that the subthreshold performance of SOI MOSFET is significantly deteriorated even under low radiation dose. But the total dose radiation tolerance of PSOI MOSFET is superior to its conventional SOI counterpart under the same radiation dose. Additionally, the influence of transistor's physical parameters on total dose radiation is analyzed. The tolerance is enhanced with the increase of the PSOI silicon window length when the devices are under high total dose conditions. Furthermore, PSOI MOSFET performs better than that of SOI MOSFET at high temperature under harsh radiation condition.
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具有良好高温性能的全剂量辐射硬化MOSFET
提出了一种全剂量辐射硬化部分绝缘体上硅(PSOI) MOSFET结构。讨论并比较了SOI和PSOI MOSFET的辐射效应。仿真结果表明,即使在低辐射剂量下,SOI MOSFET的亚阈值性能也会明显下降。但在相同辐射剂量下,PSOI MOSFET的总剂量辐射耐受能力优于常规SOI MOSFET。此外,还分析了晶体管的物理参数对总辐射剂量的影响。在高总剂量条件下,随着PSOI硅窗长度的增加,器件的耐受性增强。此外,在恶劣的辐射条件下,PSOI MOSFET在高温下的性能优于SOI MOSFET。
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