A reliable optical method for in situ process control for deposition of Cu(In,Ga)Se2 thin layers for photovoltaics

R. Hesse, R. Caballero, D. Abou‐Ras, T. Unold, C. Kaufmann, H. Schock
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引用次数: 6

Abstract

A new method for optical process control of the three-stage co-evaporation of Cu(In,Ga)Se2 thin films is presented. Precise control of the deposition process is desirable as the field of process parameters is rather complex. In an enhancement to laser light scattering (LLS) with a single photo-detector, the diffuse part of the scattered laser light is now used to a larger extent. In consequence, it is possible to deduce compositional information (e.g., the Ga/III-ratio) for the deposited layer with high accuracy. This is demonstrated in a series of experiments on Mo-coated float glass and titanium foil substrates where the final Ga content of the Cu(In,Ga)Se2 thin film has been intentionally varied. As an additional benefit of the enhanced LLS system, the new system can also be used for process control, in cases where previously the intensity of scattered component of light has not been sufficient for reliable interpretation. The information from this new monitoring technique was used to set up an optical model for semitransparent, coevaporated InxGaySez-layers of various compositions. Using this model, an evaluation of phases formed during the process and adjustment of deposition parameters is possible. The knowledge of phases formed on glass and titanium substrates is important since the Cu(In,Ga)Se2 formation depends on properties of the InxGaySez-layer evaporated in stage 1 of the three-stage process. Break-off experiments at different points within stage 1 were carried out to test and improve the model. Depth profiling by means of x-ray fluorescence (XRF) and microstructural studies by means of x-ray diffraction (XRD) also deliver valuable information for the optical model.
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一种可靠的光电用Cu(in,Ga)Se2薄层沉积原位工艺控制的光学方法
提出了一种控制Cu(In,Ga)Se2薄膜三段共蒸发光学过程的新方法。由于工艺参数领域相当复杂,需要对沉积过程进行精确控制。在单光电探测器增强激光光散射(LLS)中,散射激光的漫射部分被更大程度地利用。因此,可以高精度地推断沉积层的成分信息(例如Ga/ iii -比值)。这在mo涂层浮法玻璃和钛箔衬底上的一系列实验中得到了证明,其中Cu(in,Ga)Se2薄膜的最终Ga含量被有意地改变。作为增强型LLS系统的另一个好处,新系统还可以用于过程控制,在以前光散射成分的强度不足以进行可靠解释的情况下。从这种新的监测技术的信息被用来建立一个光学模型的半透明,共蒸发inxgaysez层的各种成分。利用该模型,可以对沉积过程中形成的相进行评估,并对沉积参数进行调整。了解在玻璃和钛基板上形成的相是很重要的,因为Cu(In,Ga)Se2的形成取决于在三阶段工艺的第一阶段蒸发的inxgaysez层的性质。在第一阶段的不同时间点进行断裂实验,对模型进行检验和改进。x射线荧光(XRF)的深度剖面和x射线衍射(XRD)的微观结构研究也为光学模型提供了有价值的信息。
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