Influence of defects on the leakage current properties in PbTiO3 and BiFeO3 single crystals

Y. Noguchi, Y. Chishima, M. Tamada, M. Miyayama
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Abstract

Single crystals of PbTiO3 (PT) and BiFeO3(BFO) were grown by a self-flux method, and the influence of lattice defects on the leakage current properties at 25degC was investigated. While PT crystals annealed in air at 700degC showed a leakage current density of the order of 10-5 A/cm2 , annealing under a high oxygen partial pressure of 35 MPa at 700degC increased the leakage current density to 10-4 A/cm2 . This increase in leakage current by the oxidation treatment provides direct evidence that electron hole plays a dominant carrier for the leakage current property in the PT system. The conductivity at 800degC of the PT crystals proportionally increased with an increase in oxygen partial pressure, and electron hole is revealed to be a detrimental carrier even at 800degC. Thermogravimetric analysis showed that a larger weight loss due to PbO vaporization was observed under a higher oxygen partial pressure at high temperatures above 1000degC. The enhanced vacancy formation of Pb under a higher oxygen partial pressure demonstrates that the surface reaction between Pb atoms and O atoms adsorbed onto the PT surface, which leads to PbO (g), is the limiting factor for the vacancy formation in the PT system. It is suggested that Pb vacancies act as an electron acceptor for generating electron holes, leading to a higher leakage current. It is found that the mechanism of the leakage curren for BFO cyrstals is almost the same as that for PT crystals.
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缺陷对PbTiO3和BiFeO3单晶漏电流特性的影响
采用自通量法生长PbTiO3 (PT)和BiFeO3(BFO)单晶,研究了晶格缺陷对25℃下漏电流性能的影响。在700℃空气中退火的PT晶体泄漏电流密度为10-5 a /cm2,在700℃高氧分压(35 MPa)下退火的PT晶体泄漏电流密度为10-4 a /cm2。氧化处理导致的泄漏电流的增加直接证明了电子空穴是PT体系中泄漏电流的主要载体。PT晶体在800℃时的电导率随氧分压的增加而成比例增加,即使在800℃时电子空穴也是有害的载流子。热重分析表明,在1000℃以上的高温条件下,较高的氧分压下,PbO汽化造成的失重较大。在较高的氧分压下,Pb的空位形成增强,说明吸附在PT表面的Pb原子与O原子之间的表面反应导致PbO (g)的生成,是PT体系中空位形成的限制因素。Pb空位作为电子受体产生电子空穴,导致更高的漏电流。研究发现,BFO晶体的漏电流形成机理与PT晶体基本相同。
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