Preparation and Properties of Lithium-doped K0.5Na0.5NbO3 Thin Films by Chemical Solution Deposition

H. Maiwa, T. Kogure, K. Ishizaka, T. Hayashi
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引用次数: 4

Abstract

Lithium doped K0.5Na0.5NbO3 films were fabricated by chemical solution deposition on Pt/TiO2/SiO2/Si substrates. Homogeneous and stable precursor solutions were prepared by controlling the reaction of starting metal alkoxides. Perovskite KNN single phase thin films were successfully synthesized on Pt/TiOx/SiO2/Si substrates. The 1.2 mum-thick KLNN film annealed at 650degC exhibited a ferroelectric polarization hysteresis loops at -250degC. The loop at room temperature is round in shape indicating the film contains leakage components. Dielectric constant under zero bias is 490 at room temperature. Typical upside-down butterfly DC bias-capacitance curve was obtained in the KLNN film capacitors at room temperature, indicating polarization reversal occurs in the obtained KLNN films.
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化学溶液沉积法制备掺杂锂的K0.5Na0.5NbO3薄膜及其性能
采用化学溶液沉积法在Pt/TiO2/SiO2/Si衬底上制备了掺杂锂的K0.5Na0.5NbO3薄膜。通过控制起始金属醇氧化物的反应,制备了均匀稳定的前驱体溶液。在Pt/TiOx/SiO2/Si衬底上成功合成了钙钛矿型KNN单相薄膜。在650℃退火的1.2 μ m- KLNN薄膜在-250℃表现出铁电极化迟滞回路。室温下的回路呈圆形,表明薄膜中含有泄漏成分。在室温下,零偏下的介电常数为490。在室温下,得到了典型的倒挂蝴蝶型直流偏置电容曲线,表明所得到的KLNN薄膜发生极化反转。
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