An SRAM based testing methodology for yield analysis of semiconductor ICs

Jannah Al-Hashimi, Seepsa Tomoq, K. Abugharbieh, Yazan Al-Qudah, Mustafa Shihadeh
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Abstract

This work presents a methodology to analyze defects in an SRAM cell based on electrical testing which can help improve yield of semiconductor ICs. It uses an algorithm that utilizes fuzzy logic techniques to post process electrical measurements to analyze the point(s) of failure. To model the impact of opens and shorts in the SRAM cell, a number of resistors were added in various locations in the schematic of a cell where a defect can occur. Simulations were run where these resistors were shorted or opened according to their location(s) and the defect(s) they represent. The work was conducted using 28 nm technology device models. Design and simulations were done using Synopsys transistor level Custom Designer software that includes HSPICE. MATLAB was used to implement the fuzzy logic based algorithm to post process the electrical simulations' results. The algorithm presented in this paper can be modified for different technology nodes and can be used by design and yield engineers in industry.
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基于SRAM的半导体集成电路良率分析测试方法
本文提出了一种基于电测试的SRAM单元缺陷分析方法,有助于提高半导体集成电路的良率。它使用了一种算法,利用模糊逻辑技术后处理电测量来分析故障点。为了模拟SRAM单元中开路和短路的影响,在可能发生缺陷的单元示意图中的不同位置添加了许多电阻。根据这些电阻器的位置和它们所代表的缺陷,在这些电阻器被短路或打开的情况下进行了模拟。这项工作是使用28纳米技术的器件模型进行的。采用包含HSPICE在内的Synopsys晶体管级定制设计软件进行设计和仿真。利用MATLAB实现基于模糊逻辑的算法,对电学仿真结果进行后处理。本文提出的算法可以针对不同的技术节点进行修改,可供工业设计和良率工程师使用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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