Driving methods of the High Voltage GaN transistor module

R. Zelnik, M. Frivaldský
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Abstract

With the development of new WBG semiconductor structures, new challenges are emerging for their use in various applications. The challenge for GaN transistors is to achieve a blocking voltage higher than 650V. There are relatively few manufacturers of GaN transistors on the market that offer higher blocking voltages than 650V. For example, if we were to use these transistors in an 800V DC converter system, we would need a transistor with a minimum blocking capacity of 1000V, including a margin of 20%. For the electric vehicle power conditioning system, a gallium nitride (GaN) power switching module with an enhanced rated voltage is proposed. GaN high-electron-mobility transistors (HEMTs) have a low breakdown voltage, which makes them unsuitable for high-voltage applications. GaN transistors may be coupled in a stacked manner, thereby doubling their blocking capabilities. If 650V transistors are employed, the blocking capacity in stacked form is 1300V. This design has various advantages but also disadvantages, which are mentioned in. One of the main disadvantages of this connection is the complex driving of the transistors so that the deviation of the redistributed voltage between the transistors is not high and thus the device is not damaged. So this article discusses gate driving solutions, which contain design and experimental results.
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高压GaN晶体管模块的驱动方法
随着新型WBG半导体结构的发展,其在各种应用中的应用也面临着新的挑战。GaN晶体管面临的挑战是实现高于650V的阻塞电压。市场上提供高于650V阻挡电压的GaN晶体管制造商相对较少。例如,如果我们要在800V直流变换器系统中使用这些晶体管,我们将需要一个具有1000V最小阻塞容量的晶体管,包括20%的余量。针对电动汽车电源调节系统,提出了一种提高额定电压的氮化镓(GaN)电源开关模块。氮化镓高电子迁移率晶体管(hemt)具有较低的击穿电压,这使得它们不适合高压应用。GaN晶体管可以以堆叠方式耦合,从而使其阻塞能力加倍。如果采用650V晶体管,则堆叠形式的阻塞容量为1300V。这种设计有各种优点,但也有缺点,在。这种连接的主要缺点之一是晶体管的复杂驱动,因此晶体管之间的再分配电压偏差不高,因此器件不会损坏。因此本文讨论了栅极驱动的解决方案,包括设计和实验结果。
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