{"title":"Vacuum Deposition Techniques in an Engineering Laboratory Facility for Producing Thin Film Integrated Circuits","authors":"R. Kraus","doi":"10.1109/TPEP.1963.1136403","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":313371,"journal":{"name":"IEEE Transactions on Product Engineering and Production","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1963-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Product Engineering and Production","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TPEP.1963.1136403","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
