{"title":"An Improved SOI-on-Glass Fabrication Method of Large-Area Sheeting of MEMS Isolator","authors":"Longqi Ran, Yichuan Wu, Jiangbo He, Binlei Cao, Zongda Hu, Wu Zhou","doi":"10.1109/NEMS57332.2023.10190975","DOIUrl":null,"url":null,"abstract":"Vibration isolators are utilized to help large-area micromirrors survive in the AEC-Q100 test. The supporting platform of the isolator, however, involves a larger area of movable silicon sheeting and is hard to be fabricated by direct etching due to the collapse and adhesion caused by thermal deformation. In this paper, an SOI-on-Glass (SOIOG) process is proposed to fabricate a large area of sheeting with a controllable air gap and four flexible beams. Six sacrificial pillars are introduced to prop up the sheeting in the center before structure release. Meanwhile, the pillars can increase heat dissipation to reduce thermal deformation during the DRIE process. Finally, an isolator with a $20.2 \\mathrm{~mm} \\times 14.2 \\mathrm{~mm}$ sheeting is fabricated successfully.","PeriodicalId":142575,"journal":{"name":"2023 IEEE 18th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE 18th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NEMS57332.2023.10190975","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Vibration isolators are utilized to help large-area micromirrors survive in the AEC-Q100 test. The supporting platform of the isolator, however, involves a larger area of movable silicon sheeting and is hard to be fabricated by direct etching due to the collapse and adhesion caused by thermal deformation. In this paper, an SOI-on-Glass (SOIOG) process is proposed to fabricate a large area of sheeting with a controllable air gap and four flexible beams. Six sacrificial pillars are introduced to prop up the sheeting in the center before structure release. Meanwhile, the pillars can increase heat dissipation to reduce thermal deformation during the DRIE process. Finally, an isolator with a $20.2 \mathrm{~mm} \times 14.2 \mathrm{~mm}$ sheeting is fabricated successfully.