Accurate Measurements of Small Resistances in Vertical Interconnects with Small Aspect Ratios

M. Stucchi, F. Fodor, E. Marinissen
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引用次数: 1

Abstract

Resistance measurements of vertical interconnect elements by cross-bridge Kelvin resistors can yield values far below the expected value, if that resistance is calculated with the simple formula based on resistivity, interconnect length, and cross-sectional area; for small resistors, the measured value can even become negative. Analysis of current and potential distributions inside the simulated structures helps both to understand the causes of these non-realistic resistance values and to improve the design of the CBKR structures for preventing underestimation of the vertical interconnect resistance.
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小纵横比垂直互连中小电阻的精确测量
如果用基于电阻率、互连长度和截面积的简单公式计算垂直互连元件的开尔文电阻,则该电阻的测量结果会远远低于期望值;对于小型电阻器,测量值甚至可能变为负值。分析模拟结构内部的电流和电位分布有助于了解这些不真实电阻值的原因,并有助于改进CBKR结构的设计,以防止垂直互连电阻的低估。
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