Electrical properties of photosensitive ZnO/Si heterostructure depending on temperature

D. Koziarskyi, E. Maistruk, I. Koziarskyi, G. O. Andrushchak
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引用次数: 1

Abstract

The transmission spectra of ZnO:Al films and I-V-characteristic of the isotype heterojunction ZnO:Al/n-Si fabricated by the method of RF magnetron sputtering of thin ZnO:Al films onto n-Si crystalline substrates were investigated and analyzed. The mechanisms of electron tunneling through the energy barrier of the heterojunction at forward and reverse biases are analyzed. The influence of temperature on the parameters of the heterojunction is determined. The photoelectric properties of the heterostructure are analyzed.
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光敏ZnO/Si异质结构随温度变化的电学特性
研究和分析了用射频磁控溅射法制备的ZnO:Al薄膜在n-Si晶体衬底上的透射光谱和同型异质结ZnO:Al/n-Si的i - v特性。分析了电子在正向偏置和反向偏置下穿过异质结能垒的机制。确定了温度对异质结参数的影响。分析了异质结构的光电特性。
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