{"title":"Well-aligned ZnO nanorods grown directly on GaN substrates for optoelectronic applications","authors":"R. Yatskiv, J. Grym","doi":"10.1109/NEMS.2016.7758226","DOIUrl":null,"url":null,"abstract":"We report on the hydrothermal growth of ZnO nanorods directly on GaN templates with a different density of dislocations. The influence of the quality of the GaN substrate on morphological and optical properties of ZnO nanorods is presented. The morphology of the ZnO nanorods was investigated by scanning electron microscopy while the optical properties were studied by low temperature photoluminescence spectroscopy. To control the position and size of the ZnO nanorods, the GaN templates were patterned by e-beam lithography.","PeriodicalId":150449,"journal":{"name":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NEMS.2016.7758226","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We report on the hydrothermal growth of ZnO nanorods directly on GaN templates with a different density of dislocations. The influence of the quality of the GaN substrate on morphological and optical properties of ZnO nanorods is presented. The morphology of the ZnO nanorods was investigated by scanning electron microscopy while the optical properties were studied by low temperature photoluminescence spectroscopy. To control the position and size of the ZnO nanorods, the GaN templates were patterned by e-beam lithography.