Structural properties of transparent Tb-doped TiO2 thin films

D. Wojcieszak, D. Kaczmarek, J. Domaradzki, A. Borkowska
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Abstract

Doping of TiO2 with various metal ions can modify its different properties. In this work, structural properties of transparent Tb-doped TiO2 thin films have been outlined. Thin films were deposited by high energy reactive magnetron sputtering (HE RMS) from metallic Ti-Tb target on Si and SiO2 substrates. Thin films were investigated by means of energy disperse spectrometry (EDS), X-ray diffraction (XRD), atomic force microscopy (AFM) and optical transmission method. From EDS measurements Tb content in prepared thin films was determined to be 0.4 at. %, 2 at. % and 2.6 at. %. XRD analysis revealed the existence of crystalline TiO2 in the form of anatase and rutile, depending on Tb amount in examined samples. AFM images showed nanocrystalline structure of prepared thin films. Optical transmission studies showed that Tb-doped thin films are transparent to visible light. Also, the slight red shift of the fundamental absorption edge of TiO2 was observed with Tb doping.
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掺杂tb的透明TiO2薄膜的结构特性
在TiO2中掺杂各种金属离子可以改变其不同的性能。在这项工作中,概述了透明掺杂tb的TiO2薄膜的结构特性。采用高能反应磁控溅射(HE RMS)技术,在Si和SiO2衬底上制备了金属Ti-Tb靶膜。采用能量分散光谱(EDS)、x射线衍射(XRD)、原子力显微镜(AFM)和光透射法对薄膜进行了研究。通过能谱仪测定制备的薄膜中Tb的含量为0.4 at。%, 2 at。%和2.6 %。%。XRD分析表明,根据样品中Tb的含量,存在锐钛矿和金红石形式的TiO2晶体。AFM图像显示制备的薄膜具有纳米晶结构。光透射研究表明,掺铥薄膜对可见光是透明的。同时,TiO2的基本吸收边也出现了轻微的红移。
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