Cai Chanlong, Han Lingxia, Zhu Chang, Wang Jimei, Yan Yixin
{"title":"Study on nickel-chrome-iron alloy film by means of the pulse multi-arc ion source","authors":"Cai Chanlong, Han Lingxia, Zhu Chang, Wang Jimei, Yan Yixin","doi":"10.1109/DEIV.2000.879047","DOIUrl":null,"url":null,"abstract":"In this paper, a new technique plating the nickel-chrome-iron alloy film by means of the pulse multi-arc ion source is introduced. In research work, the plating technology of the film with this technique is obtained and the property of the film is measured. Result indicated that the technology parameters, the technique, the uniformity and firmness of the film is appropriate. The error of the composition content between the film material and the cathode material of the pulse multi-arc ion source is less than /spl plusmn/3%. The film accords with actual demands.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"98 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2000.879047","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper, a new technique plating the nickel-chrome-iron alloy film by means of the pulse multi-arc ion source is introduced. In research work, the plating technology of the film with this technique is obtained and the property of the film is measured. Result indicated that the technology parameters, the technique, the uniformity and firmness of the film is appropriate. The error of the composition content between the film material and the cathode material of the pulse multi-arc ion source is less than /spl plusmn/3%. The film accords with actual demands.
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