Gunn Effect in n-InP MOSFET at positive gate bias and impact ionization conditions

V. Gruzinskis, E. Starikov, P. Shiktorov, H. Marinchio, J. Torres, C. Palermo, L. Varani
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引用次数: 3

Abstract

In modern FET/HEMT structures the Gunn-effect is not usually considered as one of the mechanisms able to realize high-frequency (near terahertz (THz)) oscillations of the current. Physically, the effect is caused by the suppression effect of the remote Coulomb interaction which takes place in the gated region of the conducting channel. In the present work we propose a way to overcome this limitation by using the impact ionization effect. It is shown by Monte Carlo simulation that the impact ionization in MOSFET structures allows us to get near THz oscillations.
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正栅极偏置和冲击电离条件下n-InP MOSFET的Gunn效应
在现代FET/HEMT结构中,冈恩效应通常不被认为是能够实现高频(近太赫兹)电流振荡的机制之一。物理上,这种效应是由发生在导电通道门控区域的远端库仑相互作用的抑制作用引起的。在目前的工作中,我们提出了一种利用冲击电离效应来克服这一限制的方法。蒙特卡罗模拟结果表明,MOSFET结构中的碰撞电离可以使我们获得接近太赫兹的振荡。
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