Relaxor Ferroelectric 0.2PZN-0.8PZT(53/47) Thick Films Fabricated Using a MOD Process

Xiyun He, Xinsen Zheng, P. Qiu, W. Cheng, A. Ding
{"title":"Relaxor Ferroelectric 0.2PZN-0.8PZT(53/47) Thick Films Fabricated Using a MOD Process","authors":"Xiyun He, Xinsen Zheng, P. Qiu, W. Cheng, A. Ding","doi":"10.1109/ISAF.2006.4387899","DOIUrl":null,"url":null,"abstract":"Crack free peroviskite 0.2PZN-0.8PZT (53/47) thick films up to 6.8 mum were prepared by a metallic-organic decomposition (MOD) process on platinum coated titanium (Pt/Ti) foil substrates by a dipping coating technique. The thick film exhibits a pure perovskite phase structure with dense and uniform microstructure. The dielectric, ferroelectric and piezoelectric properties of the thick film have been examined and discussed. A perfect ferroelectric P-E loop was observed. The efficient piezoelectric coefficient d33,f of the film was estimated by a standard Berlincourt type meter. The measured d33,f value of the 0.2PZN-0.8PZT (53/47) thick film is about 177 pC/N; it is larger than that of the PZT (53/47) thick film examined in the same condition, 98 pC/N. This 0.2PZN-0.8PZT (53/47) thick film promises a good application in the microelectronic devices.","PeriodicalId":441219,"journal":{"name":"2006 15th ieee international symposium on the applications of ferroelectrics","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 15th ieee international symposium on the applications of ferroelectrics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISAF.2006.4387899","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Crack free peroviskite 0.2PZN-0.8PZT (53/47) thick films up to 6.8 mum were prepared by a metallic-organic decomposition (MOD) process on platinum coated titanium (Pt/Ti) foil substrates by a dipping coating technique. The thick film exhibits a pure perovskite phase structure with dense and uniform microstructure. The dielectric, ferroelectric and piezoelectric properties of the thick film have been examined and discussed. A perfect ferroelectric P-E loop was observed. The efficient piezoelectric coefficient d33,f of the film was estimated by a standard Berlincourt type meter. The measured d33,f value of the 0.2PZN-0.8PZT (53/47) thick film is about 177 pC/N; it is larger than that of the PZT (53/47) thick film examined in the same condition, 98 pC/N. This 0.2PZN-0.8PZT (53/47) thick film promises a good application in the microelectronic devices.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
用MOD工艺制备的铁电0.2PZN-0.8PZT(53/47)厚膜
采用金属有机分解(MOD)法制备了厚达6.8 mum的无裂纹钙粘质0.2PZN-0.8PZT(53/47)薄膜。厚膜呈纯钙钛矿相结构,微观结构致密均匀。对该厚膜的介电、铁电和压电性能进行了测试和讨论。观察到一个完美的铁电P-E环。用标准柏林考特式测量仪测量了薄膜的有效压电系数d33,f。0.2PZN-0.8PZT(53/47)厚膜的d33,f值约为177 pC/N;大于相同条件下PZT(53/47)厚膜的98 pC/N。这种0.2PZN-0.8PZT(53/47)厚膜在微电子器件中具有良好的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Dielectric Behavior of PFW-PT Relaxors: Model-Parameters Extraction Synthesis, Structure and Properties of Pulsed Laser Deposited BiFeO3-PbTiO3 Thin Films Application of Dielectric, Ferroelectric and Piezoelectric Thin Film Devices in Mobile Communication and Medical Systems Relaxor Ferroelectric 0.2PZN-0.8PZT(53/47) Thick Films Fabricated Using a MOD Process Fabrication and Characterization of ZnO Films for Biological Sensor Application of FPW Device
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1