{"title":"Systematic influence of line edge roughness on the line width measured by scatterometry","authors":"T. Siefke, S. Heidenreich","doi":"10.1117/12.2675801","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":129649,"journal":{"name":"Modeling Aspects in Optical Metrology IX","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Modeling Aspects in Optical Metrology IX","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2675801","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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