{"title":"The Prelimniary Investigation of Octrafluorocyclobutane Plasma Jet Etching of Crystalline Silicon","authors":"Chun-Hao Huang, Wei-Ting Liu, Weiliang Li, Li-Ko Huang, Yi-An Chen","doi":"10.23919/SNW.2019.8782945","DOIUrl":null,"url":null,"abstract":"A capacitive coupled radio frequency double-pipe atmospheric-pressure plasma jet is used for the etching process in fabricating Micro Electro Mechanical Systems. Etchings were carried out on a crystalline silicon substrate. The etching rates can be controlled by the etch gas composition and the plasma conditions.","PeriodicalId":170513,"journal":{"name":"2019 Silicon Nanoelectronics Workshop (SNW)","volume":"90 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Silicon Nanoelectronics Workshop (SNW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/SNW.2019.8782945","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
A capacitive coupled radio frequency double-pipe atmospheric-pressure plasma jet is used for the etching process in fabricating Micro Electro Mechanical Systems. Etchings were carried out on a crystalline silicon substrate. The etching rates can be controlled by the etch gas composition and the plasma conditions.
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