Self-aligned contacts for 10nm FDSOI Node: From device to circuit evaluation

Abstract

We propose an original architecture adapted to the 10nm transistor node (pitch 64nm) for FDSOI technology. This structure features self-aligned contacts and a gate capping dielectric layer preventing any short in case of lithographic misalignment of contacts. 2D simulations are carried out to quantify parasitic capacitances. Technological solutions are then proposed to optimize this key parameter. Consequences are evaluated at the device and circuit scale. It is shown that the use of low-k materials, such as airgap spacers, is a solid option to meet the 10nm node specifications.