Multilayers for EUV, soft x-ray and x-ray optics

SPIE OPTO Pub Date : 2016-05-02 DOI:10.1117/12.2218081
Zhanshan Wang, Qiushi Huang, Zhong Zhang
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Abstract

Driven by the requirements in synchrotron radiation applications, astronomical observation, and dense plasma diagnostics, the EUV, soft X-rays and X-rays multilayer optics have been tremendously developed. Based on the LAMP project for soft X-ray polarimetry, Co/C and Cr/C multilayers have been fabricated and characterized. Both Co/C and Cr/C multilayers reveal good optical performance working at 250 eV. Pd/Y multilayers have been successfully fabricated using reactive sputtering with nitrogen working at around 9.4 nm. EUV normal incidence Schwarzschild and soft X-ray grazing incidence KB microscopes were developed for ICF plasma diagnostics. This paper covers the outline of the multilayer optics and the current status in our lab.
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用于EUV,软x射线和x射线光学的多层材料
在同步辐射应用、天文观测和致密等离子体诊断等方面的需求推动下,EUV、软x射线和x射线多层光学得到了极大的发展。基于LAMP软x射线偏振计,制备了Co/C和Cr/C多层膜,并对其进行了表征。Co/C和Cr/C多层膜在250 eV下均表现出良好的光学性能。利用反应溅射技术成功制备了Pd/Y多层膜,氮在9.4 nm左右工作。开发了用于ICF等离子体诊断的EUV正常入射史瓦西显微镜和软x射线掠射入射KB显微镜。本文介绍了多层光学的概况和本实验室的研究现状。
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