Combined Effects of Tantalum Ion and Gamma Ray Irradiations on MOS Devices with Atomic Layer Deposited $\mathrm{A}1_{2}\mathrm{O}_{3}$ Gate Dielectrics

Z. Zheng, Huiping Zhu, Xi Chen, Lei Wang, Bo Li, Jiantou Gao, Duoli Li, Jiajun Luo, Zhengsheng Han, Xinyue Liu, Jie Liu
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Abstract

MOS devices with $\mathrm{A}1_{2}\mathrm{O}_{3}$ dielectrics are irradiated sequentially using gamma rays and 1907 MeV tantalum ions, and the combined irradiation effects on the $\mathrm{A}1_{2}\mathrm{O}_{3}$ based MOS devices are investigated and the mechanism is analyzed.
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钽离子和伽马射线辐照对原子层沉积$\ mathm {A}1_{2}\ mathm {O}_{3}$栅极电介质MOS器件的联合效应
采用伽玛射线和1907 MeV钽离子对具有$\ maththrm {A}1_{2}\ maththrm {O}{3}$电介质的MOS器件进行了序次辐照,研究了复合辐照对$\ maththrm {A}1_{2}\ maththrm {O}{3}$基MOS器件的影响,并分析了辐照机理。
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