Absorption of NiCr and Cr Films in the Millimeter Wavelength Range

A. Oleynik, V. S. Andreev
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Abstract

This paper describes the technology for manufacturing nichrome and chromium films on mica substrates by thermal vacuum deposition. The thickness of these films controlled by a resistive method, which ensures the production of films with a thickness of ~10 nm. Experimental results of the study of absorption of film structures of nichrome-mica, chromium-mica in the frequency range of 75–260 GHz on the installation consisting of a vector analyzer of electrical circuits R&SZVA-40 by Rohde&Schwarz with the measuring channels. The dependence of the absorption coefficient of nichrome and chromium films at the level of 0.5 in the frequency ranges 102–110 GHz, 206.6-223.6 GHz and 102-116,6 GHz, 206-226,6 GHz, respectively, is obtained. It is advisable to use films as a millimeter radiation absorber.
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毫米波范围内NiCr和Cr薄膜的吸收
本文介绍了利用热真空沉积技术在云母基底上制备镍铬和铬薄膜的工艺。通过电阻法控制薄膜的厚度,保证了薄膜的厚度在~ 10nm。在由罗德与施瓦茨公司安装的电路矢量分析仪R&SZVA-40上,用测量通道研究了75-260 GHz频率范围内镍云母、铬云母薄膜结构的吸收实验结果。在102 ~ 110 GHz、206.6 ~ 223.6 GHz和102 ~ 116、6 GHz、206 ~ 226、6 GHz频率范围内,得到了镍铬膜和铬膜在0.5水平上的吸收系数的依赖关系。建议使用薄膜作为毫米波辐射吸收剂。
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